HYDRAULIC PAD CONDITIONING
Original Publication Date: 1997-Sep-01
Included in the Prior Art Database: 2002-May-29
In this work., we review the current methods of pad conditioning used with Chemical Mechanical Polishing (CMP) tools and then describe hydraulic pad conditioning. The apparatus and methodology presented herein regarding hydraulic pad conditioning are applicable to all polishing tools from any of the recognized suppliers of this type of equipment.