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METHOD OF CUTTING DOUBLE-POLY CAPACITORS USING A FOCUSED ION BEAM MACHINE

IP.com Disclosure Number: IPCOM000008263D
Original Publication Date: 1997-Sep-01
Included in the Prior Art Database: 2002-May-31

Publishing Venue

Motorola

Related People

Authors:
Wayland Seifert David Perrin Carlos Greaves Mat Rybicki

Abstract

Focused Ion Beam (FIB) machines have found extensive use in the semiconductor industry in the area of post processing analysis or failure analysis (FA). Frequently, the analog circuits on early samples of an integrated circuit require a trim because of unanticipated process variations. Having the ability to trim a capacitor's top poly without generating new masks would allow verification of the trim while saving valuable time and money.