METHOD OF CUTTING DOUBLE-POLY CAPACITORS USING A FOCUSED ION BEAM MACHINE
Original Publication Date: 1997-Sep-01
Included in the Prior Art Database: 2002-May-31
Focused Ion Beam (FIB) machines have found extensive use in the semiconductor industry in the area of post processing analysis or failure analysis (FA). Frequently, the analog circuits on early samples of an integrated circuit require a trim because of unanticipated process variations. Having the ability to trim a capacitor's top poly without generating new masks would allow verification of the trim while saving valuable time and money.