Dismiss
InnovationQ will be updated on Sunday, September 22, from 10am-noon ET. You may experience brief service interruptions during that time.
Browse Prior Art Database

OPTIMIZATION OF WAFER RINSING

IP.com Disclosure Number: IPCOM000008359D
Original Publication Date: 1997-Sep-01
Included in the Prior Art Database: 2002-Jun-10
Document File: 4 page(s) / 212K

Publishing Venue

Motorola

Related People

Authors:
Thomas Roche Thomas Peterson

Abstract

This work describes the experiments which have been done relating the amount of chemical remaining on the wafers with variables of the rinse such as temperature, flow rate, dump rinsing and the cycling of the rinse valves. We have found that the efftciency of water use can be improved by simply cycling the water flow on and off, with up to an order of magnitude less chemical remaining on the wafer with pulsing compared with the same amount of water used without pulsing. The reasons for this result are still being investigated.