Optimized Sputter Tool Magnet Configuration for Improving Wafer Film Uniformity and Sputter Target Utilization
Publication Date: 2002-Jun-17
The IP.com Prior Art Database
Disclosed is a method for improving wafer film uniformity and sputter target utilization by optimizing the sputter tool magnet configuration. Benefits include the elimination of erosion "profiles," or grooves, on the sputtering target.