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Browse Prior Art Database

DEFECTIVITY REDUCTION ON LITHOGRAPHY EXPOWRE SYSTEMS

IP.com Disclosure Number: IPCOM000008760D
Original Publication Date: 1998-Jun-01
Included in the Prior Art Database: 2002-Jul-10
Document File: 3 page(s) / 227K

Publishing Venue

Motorola

Related People

Authors:
Karl E. Mautz Mark Hiatt

Abstract

A technique to reduce printing defects on litho- graphy wafers has been developed. This involves the use of an automated system to diagnose and remove particles or contamination from the litho- graphic exposure tool chuck surface.