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Method for a double-exposure technique with a reverse tone-mask pattern or trim mask for flare compensation in lithography

IP.com Disclosure Number: IPCOM000010024D
Publication Date: 2002-Oct-09
Document File: 4 page(s) / 218K

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is a method for a double-exposure technique with a reverse tone-mask pattern or trim mask for flare compensation in lithography. Benefits include improved performance.