Adaptive Optical Proximity Correction (OPC) Dissection
Publication Date: 2002-Nov-11
The IP.com Prior Art Database
The quality of optical proximity correction results, as well as all proximity corrections, for is heavily dependent on the dissection, or segmentation, of the layout. A method for adaptively dissecting layouts is proposed in which the OPC program, and/or a subsequent silicon-versus-layout verification tool, checks between evaluation points for large variances, aka ripples, and adjusts the segmentation, e.g. increases it, for those areas with large variances.