Flying Height Characterization Below 10 nm
Original Publication Date: 2002-Dec-03
Included in the Prior Art Database: 2002-Dec-03
Flying Height Characterization Below 10 nm Presented is an alternative method for the characterization of FH when spacings get below 10nm. At these levels the industry is faced with an accuracy problem. Many have tried to address the problem with only some success. New optical techniques have been proposed (and patented). The reduced spacing will only get worse and the system proposed here is a departure from conventional characterization methodology.