InnovationQ will be updated on Sunday, September 22, from 10am-noon ET. You may experience brief service interruptions during that time.
Browse Prior Art Database

Quality AlignmentTargets for Thick Sputtered Film Deposition

IP.com Disclosure Number: IPCOM000010454D
Original Publication Date: 2002-Dec-03
Included in the Prior Art Database: 2002-Dec-03
Document File: 2 page(s) / 41K

Publishing Venue



Quality alignment marks and overlay test sites are crucial for pattern recognition in photolithographic steppers and overlay metrology systems. Producing quality targets in thick sputtered materials is challenging due to the type of edges that can occur over the underlying layer. This disclosure describes a method to tackle these challenges.