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Method for productivity and yield improvement in dry plasma etch and ash tools by using chemical-based cleaning

IP.com Disclosure Number: IPCOM000010961D
Publication Date: 2003-Feb-05

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is a method for productivity and yield improvement in dry plasma etch and ash tools by using chemical-based cleaning. Benefits include improved productivity, improved throughput, and improved reliability.