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A Method To Correct For Image Imbalance In Alternating Phase Shift Mask Lithography

IP.com Disclosure Number: IPCOM000011004D
Publication Date: 2003-Feb-06

Publishing Venue

The IP.com Prior Art Database

Abstract

Insertion of a feature into a 0 degree phase area in a phase shift mask helps compensate for image imbalance due to phase shifting. The feature can be a subresolution feature and can vary in size to compensate for image imbalance. The feature can be combined with other image imbalance techniques such as undercutting phase shift areas and/or biasing lines.