A Method To Correct For Image Imbalance In Alternating Phase Shift Mask Lithography
Publication Date: 2003-Feb-06
The IP.com Prior Art Database
Insertion of a feature into a 0 degree phase area in a phase shift mask helps compensate for image imbalance due to phase shifting. The feature can be a subresolution feature and can vary in size to compensate for image imbalance. The feature can be combined with other image imbalance techniques such as undercutting phase shift areas and/or biasing lines.