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Method And Apparatus Of Wafer Print Simulation Using Hybrid Model With Mask Optical Images Disclosure Number: IPCOM000011786D
Publication Date: 2003-Mar-14

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A simulation tool can generate a simulated wafer image having the accuracy of a photoresist model with the speed of an optical model by using a threshold look up table. In one embodiment, the threshold look up table could include variables such as feature size, pitch size, feature type, and defect type.