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Contamination Protection Method for Next Generation Lithography Masks

IP.com Disclosure Number: IPCOM000012020D
Publication Date: 2003-Apr-02

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is a method for protecting a next generation lithography (NGL) mask by freezing it within a solid block of suitable material (e.g. CO2) using a condensation/sublimation process. Benefits include protecting the mask from particles and molecular contamination.