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Method for the use of a HDP multi-layer (PSG/USG) film stack for ILD0 application

IP.com Disclosure Number: IPCOM000012356D
Publication Date: 2003-Apr-30

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is a method for the use of a high-density plasma (HDP) multi-layer phosphosilicate glass/undoped silicate glass (PSG/USG) film stack for interlayer dielectric base layer (ILD0) application. Benefits include improved production yields and improved ease of manufacturing.