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Method for an EUV interferometric lithography technique using a phase-shifting grating and curved multilayer mirrors

IP.com Disclosure Number: IPCOM000012940D
Publication Date: 2003-Jun-11

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is a method for an extreme ultraviolet (EUV) interferometric lithography technique using a phase-shifting grating and curved multilayer mirrors. Benefits include improved functionality, improved performance, and improved cost effectiveness.