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End Point Detection (EPD) logic Disclosure Number: IPCOM000013225D
Original Publication Date: 2002-Jan-01
Included in the Prior Art Database: 2003-Jun-18

Publishing Venue



Disclosed is a calculation logic for the endpoint monitoring system that is used to detect the end of process, such as the in-situ cleaning of PECVD (Plasma Enhanced Chemical Vapor Deposition) or dry etching of RIE (Reactive Ion Etcher) in a semiconductor manufacturing and a liquid crystal display manufacturing. This calculation logic can provide the error compensation for the threshold that is used for the process end detection and can tell more accurate end time. Delta time Standard Threshold case Load voltage differential (V/sec)