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Rapid Giant MR/Spin Valve Initialization Process Via Pulse Heating

IP.com Disclosure Number: IPCOM000014333D
Original Publication Date: 1999-Oct-01
Included in the Prior Art Database: 2003-Jun-19

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Related People

Joseph Fatula Robert Browne Ching Yee Bob Hitzfeld Joseph Smyth


Process: The wafer is heated with optical pulse energy 51g. 100NS 300 M Sec to critical temperature. The magnet remains on as the wafer cools below critical temperature. Advantage: The heat up/ cool down cycle is limited by optical energy pulse, not wafer mass. 1