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A NEW MICRO-DEVICE PRODUCTION METHOD BY USING RESIST REMOVAL REDUCTION PROCESS (RRR process)

IP.com Disclosure Number: IPCOM000014489D
Original Publication Date: 2001-Oct-01
Included in the Prior Art Database: 2003-Jun-19

Publishing Venue

IBM

Abstract

A new micro-device production method by using Resist Removal Reduction process (RRR process) T. Sakai 1. Abstract This article describes a new method for producing the micro-device. This is a new process which can reduce photo resist removal step. (Resist Removal Reduction process , RRR process) This RRR process uses the leveling method which level the surface made by photo resist pattern by the resist solvent. 2. Comparison the conventional method and this new method