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HIGH-EFFICIENCY DISK TYPE TRAP (ON EXHAUST LINE FOR CVD PROCESS)

IP.com Disclosure Number: IPCOM000014523D
Original Publication Date: 2001-Aug-01
Included in the Prior Art Database: 2003-Jun-19

Publishing Venue

IBM

Abstract

1.Disclosed is a High-effciency disk type trap on exhaust line for Chamical Vaper Deposition Process. This invention is newly construction of the TRAP. It's more effective, when user want to lower the concentration of the exhaust gas on the device manufacturing equipment. As compared with normal construction, this TRAP has an outstanding effect. It improve the TRAPPING RATE, but PRESSURE LOSS don't increase. The detail of a invention, attach separator plate to TRAP, and change pitch of disk. So enlarge pitch at entry, and narrow it at exit. Therefore this invention layers construction of this TRAP, so gas flow route become longer, the gas concentration lower in this TRAP.