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Thin film analyzer

IP.com Disclosure Number: IPCOM000014734D
Original Publication Date: 2002-Apr-11
Included in the Prior Art Database: 2003-Jun-20

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In the semcinductor wafer fab such as 200mm line, Chemical vapor deposion (CVD) insulator film has been used for many process step like interlayer dielectric between multi-layer Aluminum(Al) line , belween Al and polysilicon line (silicide etc) , barrier nitride film at contact hole and final passivation film. And there are so many kinds of CVD film like barrier silicon nitride (SixNy),Phospo silicate glass(PSG) or Boro-phospho silicate glass (BPSG) and Non-doped silicon oxide (SixOy) and which is called Plasma enhansed CVD (PECVD) film. But PECVD tool has multi-process parameter as shown below. 1: Chamber pressure 2. Heater stage for wafer chamber