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Thin film analyzer

IP.com Disclosure Number: IPCOM000014734D
Original Publication Date: 2002-Apr-11
Included in the Prior Art Database: 2003-Jun-20

Publishing Venue

IBM

Abstract

In the semcinductor wafer fab such as 200mm line, Chemical vapor deposion (CVD) insulator film has been used for many process step like interlayer dielectric between multi-layer Aluminum(Al) line , belween Al and polysilicon line (silicide etc) , barrier nitride film at contact hole and final passivation film. And there are so many kinds of CVD film like barrier silicon nitride (SixNy),Phospo silicate glass(PSG) or Boro-phospho silicate glass (BPSG) and Non-doped silicon oxide (SixOy) and which is called Plasma enhansed CVD (PECVD) film. But PECVD tool has multi-process parameter as shown below. 1: Chamber pressure 2. Heater stage for wafer chamber