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Definition of write gap in recording head with plating and ion-implantation Disclosure Number: IPCOM000015367D
Original Publication Date: 2002-Feb-15
Included in the Prior Art Database: 2003-Jun-20

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A novel approach to manufacture high aspect ratio magnetic pole tip utilizing ion implantation is disclosed here. A complete pole structure is shown schematically in Figure 1. Pole tip P2 is magnetically separated from P1 by a thin layer of magnetic insulator. A key feature is the step etched into P1 (the notch) for improved magnetic flux confinement. Current manufacturing process entails initial formation of P2 structure with height of over two times the final height. This is to facilitate "notching" of P1 (the step formation through the insulating layer) and trimming for width control by ion-milling. The poor selectivity of this process necessitates that the initial P2 height to greater than 4mm despite final P2 height requirement of only about 2mm. Figure 1: Final Structure P2 (height 2um, width <0.35um) Notch (~200nm)