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Integrated rework modules on resist track

IP.com Disclosure Number: IPCOM000018349D
Original Publication Date: 2002-Jun-01
Included in the Prior Art Database: 2003-Jul-23

Publishing Venue

Siemens

Related People

Authors:
Ralf Schuster David Zeglinski [+details]

Abstract

Lithography tools have set examples for productivity improvement in IC manufacturing. They have evolved from single tools to lithography photocells with integrated exposure tools and photoresist tracks that handle wafers from a common loadport. The next step has been to integrate metrology modules (such as a ashing chamber) on the track. One of the major additions to cycle time in the li- thography area is wafers waiting for rework proc- essing that is usually done by stripping the photore- sists in a wet clean or a ash chamber. These additions to the cycle time include transfer times, operator availability and tool availability.