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Method for activated gaseous and vapor HF delivery methodologies for creating uniform low-K ILD systems

IP.com Disclosure Number: IPCOM000019040D
Publication Date: 2003-Aug-27

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is a method for activated gaseous and vapor hydrogen fluoride (HF) delivery methodologies for creating uniform low-dielectric constant (K) interlayer dielectric (ILD) systems. Benefits include improved functionality, improved performance, and improved support for future technology.