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Precision silicon optical bench fabricated with combination of anisotropic wet etching and high rate reactive ion etching

IP.com Disclosure Number: IPCOM000019161D
Original Publication Date: 2003-Sep-02
Included in the Prior Art Database: 2003-Sep-02

Publishing Venue

IBM

Abstract

A method for fabricating a Silicon optical bench for precision alignment of passive optical components such as optical fibers, ball lens and optical isolators using a combination of anisotropic wet etching and high rate reactive ion etching is disclosed. The combination of the two etching methods means that corner compensation structures are not needed and unique structure such as rhomboid shaped cavities for optical isolators, features to aid in assembly such as adhesive cavities, simplified receivers and fiber stops can be readily formed.