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Minimal Dummy Wafer Load for Doped Silicon Films in an LPCVD Furnace: Reduced Operating Costs and Improved Tool Throughput

IP.com Disclosure Number: IPCOM000019200D
Publication Date: 2003-Sep-04

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The IP.com Prior Art Database

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Authors:
S. Brad Herner

Abstract

In general, uniformity of deposition in an LPCVD process is improved when the boat is full, with a wafer in every slot. If fewer than a full boat load of wafers are to be processed, unused slots are often filled with dummy wafers. Loading and unloading dummy wafers is time-consuming, however, and dummy wafers must be replaced regularly, increasing cost. Identifying the minimum number of dummy wafers required for uniform deposition and optimizing loading of the boat improves throughput and decreases cost.