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Implementation of an In-Situ Pre-Electroplate Deionized Rinse in the Plating Cell

IP.com Disclosure Number: IPCOM000019833D
Publication Date: 2003-Oct-01

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is a method that uses an in-situ pre-rinse in the plating cell. Benefits include a reduction in integrated defects and an improvement in wetting prior to electroplating.