System and Method for Defect Analysis of Photolithographic Mask Based on Device Performance Evaluation
Publication Date: 2003-Oct-16
The IP.com Prior Art Database
Current state of the art mask inspection systems use simulation of the layout, e.g. GDS-II, to assist in decision making about the printability of defects. However, closer analysis of selected defect areas using device simulation (e.g. using TCAD tools) can improve decision making by permitting decisions based on predicted device performance.