A Simulation-Based Method For Resolution of Phase-Shifter Placement Conflicts in Full Phase Alternating Aperture PSM
Publication Date: 2003-Oct-16
The IP.com Prior Art Database
The assignment of phase to the phase-shifters in an alternating aperture phase shifting (AAPS) mask can be a difficult problem due to phase, or coloring, conflicts. A method for resolving those conflicts using simulation of critical areas adjacent to the phase shifters causing the conflicts. These simulations can then be used to associate a cost with different possible resolutions and thus facilitate a final choice of resolutions.