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A Simulation-Based Method For Resolution of Phase-Shifter Placement Conflicts in Full Phase Alternating Aperture PSM Disclosure Number: IPCOM000020000D
Publication Date: 2003-Oct-16

Publishing Venue

The Prior Art Database


The assignment of phase to the phase-shifters in an alternating aperture phase shifting (AAPS) mask can be a difficult problem due to phase, or coloring, conflicts. A method for resolving those conflicts using simulation of critical areas adjacent to the phase shifters causing the conflicts. These simulations can then be used to associate a cost with different possible resolutions and thus facilitate a final choice of resolutions.