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Method for resist material removal for the rework of wafers in lithography using the spin/coater track system

IP.com Disclosure Number: IPCOM000020322D
Publication Date: 2003-Nov-12

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is a method for resist material removal for the rework of wafers in lithography using the spin/coater track system. Benefits include improved functionality, improved yield, and reduced test wafer consumption.