Browse Prior Art Database

Method for point-of-use means of supplying wafer fabrication cleanroom air with a low or reduced AMC level to the air in-take of process tools

IP.com Disclosure Number: IPCOM000020324D
Publication Date: 2003-Nov-12

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is a method for point-of-use means of supplying wafer fabrication cleanroom air with a low or reduced airborne molecular contamination (AMC) level to the air in-take of process tools. Benefits include improved functionality, improved performance, and improved yield.