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Method for dynamically controlling and reducing stress on photomasks during pellicalization using in-place monitoring sensors

IP.com Disclosure Number: IPCOM000020400D
Publication Date: 2003-Nov-19

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is a method for dynamically controlling and reducing stress on photomasks during pellicalization using in-situ monitoring sensors. Benefits include improved functionality, improved performance, and improved yield for photolithography.