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Method for a substrate-insensitive photoresist layer as an interaction barrier for sensitive high-performance photoresists

IP.com Disclosure Number: IPCOM000020722D
Publication Date: 2003-Dec-10

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is a method for a substrate-insensitive photoresist layer as an interaction barrier for sensitive high-performance photoresists. Benefits include improved yield and improved performance.