CHUCK CLEANING T OOL WITH ARTICULATING SURFACE
Original Publication Date: 2000-Nov-01
Included in the Prior Art Database: 2004-Jan-16
Sony Technical Digest
This new chuck cleaning tool design integrates the cleaning tool surface area with a larger footprint, thereby creating less pressure and less friction and thus producing fewer defects. The new fixture will provide a much easier way of cleaning off photo resist, which tends to leave residue on the chuck. The new design will eliminate particles and will reduce hot spots on the chuck, which will in turn produce higher yields. The original fixture is a fixed tool that causes abrading and particle accumulation on the clean wipe. If not cleaned up properly, the particles will lay on the chuck and become embedded into the wafers.