Browse Prior Art Database

CHUCK CLEANING T OOL WITH ARTICULATING SURFACE

IP.com Disclosure Number: IPCOM000021394D
Original Publication Date: 2000-Nov-01
Included in the Prior Art Database: 2004-Jan-16

Publishing Venue

Sony Technical Digest

Related People

Inventors:
Landon Allen Roger De Luna, Jr. Douglas A. Czaja

Abstract

This new chuck cleaning tool design integrates the cleaning tool surface area with a larger footprint, thereby creating less pressure and less friction and thus producing fewer defects. The new fixture will provide a much easier way of cleaning off photo resist, which tends to leave residue on the chuck. The new design will eliminate particles and will reduce hot spots on the chuck, which will in turn produce higher yields. The original fixture is a fixed tool that causes abrading and particle accumulation on the clean wipe. If not cleaned up properly, the particles will lay on the chuck and become embedded into the wafers.