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Regeneration Process for Stencil Masks Used in Ion Beam Patterning

IP.com Disclosure Number: IPCOM000021533D
Original Publication Date: 2004-Jan-22
Included in the Prior Art Database: 2004-Jan-22

Publishing Venue

IBM

Abstract

Ion beam irradiation through a stencil mask is a well known technique for generating micro- or nano-structured materials [1,2,3,4]. Using this technique, the structures defined by the openings in the mask membrane are transferred into a resist or another kind of ion irradiation sensitive material such as magnetic Co/Pt multilayer thin films.