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Method for in-line point of use chemical mixing for post-CMP cleaning

IP.com Disclosure Number: IPCOM000022017D
Publication Date: 2004-Feb-18

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is a method for in-line point of use chemical mixing for post-chemical/mechanical polishing (CMP) cleaning. Benefits include improved environmental friendliness, improved functionality, improved performance, an improved development environment, improved design flexibility, and improved cost effectiveness.