MASK IMAGING PROCESSES
Original Publication Date: 1976-Aug-31
Included in the Prior Art Database: 2004-Mar-27
Xerox Disclosure Journal
A high photosensitive imaging system is provided to provide a mask pattern through which a photomechanical image conversion can then be applied to transmit the image of the mask onto a suitably sensitized medium which may be the final output or which may be utilized as a master to prepare multiple final copies.