AN IMPROVED WATERLESS PRINTING MASTER
Original Publication Date: 1977-Oct-31
Included in the Prior Art Database: 2004-Mar-31
Xerox Disclosure Journal
Multiblock copolymers of polydimethylsiloxane and alpha-methyl-styrene have been employed for waterless lithography but the run length of such a master was limited to several hundred offset prints due to an unacceptable increase in back-ground density on the prints and to less than 100 prints, direct mode, due to loss of image (inadequate toner bond).