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A MODIFIED RATE MONITOR

IP.com Disclosure Number: IPCOM000023793D
Original Publication Date: 1979-Feb-28
Included in the Prior Art Database: 2004-Mar-31

Publishing Venue

Xerox Disclosure Journal

Abstract

The rate of evaporation of metals in a vapor deposition process is controlled by monitoring vapor content of the evaporation chamber rather than the temperature of the evaporation crucible. In the figure, evaporation chamber 1 houses crucible 2 which is electrically heated from power supply 3. Power supply 3 is alternatively