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LASER LITHOGRAPHY FOR LARGE AREA THIN FILM ELECTRONICS

IP.com Disclosure Number: IPCOM000024387D
Original Publication Date: 1980-Jun-30
Included in the Prior Art Database: 2004-Apr-02

Publishing Venue

Xerox Disclosure Journal

Abstract

Linear marking arrays and flat screen displays require high-densit y microelectronic circuits containing transistors, resistors, and capacitors over dimensions exceeding 10 inches. These circuits, in general, involve 5-10 Am minimum feature size. Presently, such circuits can be produced only by conventional photolithography using large photolithographic masks. These masks are very expensive to manufacture ($1,000 minimum), they are fragile, they have a short, useful life and even then a 99.9% defect-free image is very hard to achieve over the large area.