RETICLE INSPECTION USING DIFFRACTION PATTERN MASKING
Original Publication Date: 1984-Feb-29
Included in the Prior Art Database: 2004-Apr-04
Xerox Disclosure Journal
Described is an electro-optical system for the inspection of reticles used in integrated circuit wafer fabrication. The system utilizes diffraction patterns generated by the reticle to differentiate between valid patterns on the reticle and defects.