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Browse Prior Art Database

RETICLE INSPECTION USING DIFFRACTION PATTERN MASKING

IP.com Disclosure Number: IPCOM000025227D
Original Publication Date: 1984-Feb-29
Included in the Prior Art Database: 2004-Apr-04

Publishing Venue

Xerox Disclosure Journal

Abstract

Described is an electro-optical system for the inspection of reticles used in integrated circuit wafer fabrication. The system utilizes diffraction patterns generated by the reticle to differentiate between valid patterns on the reticle and defects.