Browse Prior Art Database

Original Publication Date: 1984-Jun-30
Included in the Prior Art Database: 2004-Apr-04

Publishing Venue

Xerox Disclosure Journal


The ion beam deposition of hydrogenated amorphous silicon films for use in xerographic photoreceptor applications has recently been disclosed. Figures 1 and 2 illustrate two general alternative manners in which a number of drums can be fabricated by such a process. In Figure 1, a plurality of cylindrical drum substrates 10 are rotatably mounted on cylindrical drum supports 12 and driven through intermeshing gears 14 and 16 from a central drive gear 18 mounted to rotate about the driven drum cylindrical supports 12 the assembly of four drums is mounted on multiple drum holder 24 which slowly revolves around the drum drive shaft in a direction counter to the rotational motion of each of the drums. This rotational and revolutional assembly for the drums is located in the center of a plurality of ion beam generating apparatus which comprises the plurality of ion beam sources 26 used to direct an ion beam towards a plurality of water cooled targets 28. The silicon targets are sputtered at near glancing angles of incidence of the order of, for example, 15' by an intense collimated low energy ion beam of hydrogen and an inert gas, typically argon. At the near glancing angles maximum deposition rate of amorphous silicon on the drum substrate is obtained. Furthermore, with the rotational and revolutional movement of the individual drums, uniform deposition of amorphous silicon on the drum substrate is also achieved. If desired, the drums may be heated internally by a quartz lamp or filament heaters. The ion beam flux can be provided by either an array of multiple cylindrical or large linear sources. This technique has the advantage of providing a relatively straight forward scale up to multiple drum manufacture.