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METHOD FOR MAKING HIGH RESOLUTION STYLI

IP.com Disclosure Number: IPCOM000025351D
Original Publication Date: 1984-Dec-31
Included in the Prior Art Database: 2004-Apr-04

Publishing Venue

Xerox Disclosure Journal

Abstract

A method is disclosed for facilitating the manufacture of low voltage electro-graphy stylus arrays through the use of thin film photoresist pattern delineation followed by electroplating or electroforming and comprises the steps of: providing a conductive substrate; placing a very thin film of an insulating photoresist material on the conductive substrate, exposing the photoresist material to a high resolution pattern; removing the softened material to thereby leave the pattern; placing the conductive substrate into a nickel sulfamate bath whereby the nickel ions migrate to the areas of the conductive substrate where the photoresist material has been removed and thereby building up in a laminar manner to provide a smooth top and rounded edges; attaching an encapsulating layer to the top of the nickel layer; removing the bottom conductive layer by heating the material; and removing the photoresist material by stripping in order to bare a high resolution styli pattern.