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A PRINT BAR UTILIZING A SILICON MICRODEFLECTOR ARRAY + TOTAL INTERNAL REFLECTION

IP.com Disclosure Number: IPCOM000025600D
Original Publication Date: 1986-Aug-31
Included in the Prior Art Database: 2004-Apr-04

Publishing Venue

Xerox Disclosure Journal

Abstract

Referring to Figure la, a microdeflector is a thin (typically <0.5 micron), flexible, cantilevered finger 4 of silicon dioxide on a silicon substrate 5 The cantilevered finger 4 is formed by anisotropically etching the silrcon from beneath the silicon oxide using EDP (ethylene diamine pyrocatechol and water). The extent of the etch in the lateral direction is determined by the large etch ratio between and el11 > planes of silicon and the depth of the well is controlled by the inability of EDP to etch silicon heavily doped with boron. The top surface of the finger 4 is covered with a layer of gold (Au)