Browse Prior Art Database

GENERATION OF A RE-ENTRANT LIFT-OFF PHOTORESIST PROFILE BY USING A TWO-LAYER PMMA STRUCTURE

IP.com Disclosure Number: IPCOM000025701D
Original Publication Date: 1987-Jun-30
Included in the Prior Art Database: 2004-Apr-04

Publishing Venue

Xerox Disclosure Journal

Abstract

One method for creating IC patterns is referred to as "lift-off. A pattern is defined on a wafer using a photosensitive polymer structure, usually with a high aspect ratio. A deposition ste is performed which deposits an overlying