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ISOTROPICALLY ETCHED SILICON NOZZLE FACES

IP.com Disclosure Number: IPCOM000026010D
Original Publication Date: 1989-Oct-31
Included in the Prior Art Database: 2004-Apr-05

Publishing Venue

Xerox Disclosure Journal

Abstract

It is well known to fabricate ink jet nozzles for silicon printheads using orientation dependent etching (ODE). However, the nature of ODE does not allow a single step process to produce a nozzle face since only interior corners are controllable durin the etching process. If the nozzle face is fabricated by