ULTRAVIOLET OZONE METHOD OF CLEANING PHOTORECEPTOR SUBSTRATES
Original Publication Date: 1993-Aug-31
Included in the Prior Art Database: 2004-Apr-06
Publishing Venue
Xerox Disclosure Journal
Abstract
Disclosed is a proposed method for removing trace organic contaminants from aluminum photoreceptor drum substrates. By placing the photoreceptor in a quartz housing and irradiating with 185-254 nm UV light in the presence of oxygen organic contaminants are oxidized by ozone generated in situ. The method may also result in the formation of an acceptable aluminum oxide blocking layer of desired thickness on the surface of the aluminum drum substrate. The method provides photoreceptor aluminum drum substrates which are free of organic contaminants and have aluminum oxide blocking layers with improved thickness and uniformity compared to substrates prepared by conventional methods.
XEROX DISCLOSURE JOURNAL
ULTRAVIOLET OZONE METHOD Proposed Classification OF CLEANING PHOTORECEPTOR U.S. C1.355/246 SUBSTRATES Int. C1. GOln 01/10 Allen F. DeLuca
Roger W. LaForce
Thomas P. Debies
Disclosed is a proposed method for removing trace organic contaminants from aluminum photoreceptor drum substrates. By placing the photoreceptor in a quartz housing and irradiating with 185-254 nm UV light in the presence of oxygen organic contaminants are oxidized by ozone generated in situ. The method may also result in the formation of an acceptable aluminum oxide blocking layer of desired thickness on the surface of the aluminum drum substrate. The method provides photoreceptor aluminum drum substrates which are free of organic contaminants and have aluminum oxide blocking layers with improved thickness and uniformity compared to substrates prepared by conventional methods.
Reference A related method is described by J.R. Vig in J. Vac Sci. & Tech. 3(3), 1027
(1985).
XEROX DISCLOSURE JOURNAL - VO~. 18, NO. 4 July/August 1993 409
410 XEROX DISCLOSURB JOURNAL - Vol. 18, No. 4 July/August 1993