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RESISTIVE ION SOURCE CHARGING DEVICE

IP.com Disclosure Number: IPCOM000026972D
Original Publication Date: 1994-Oct-31
Included in the Prior Art Database: 2004-Apr-07

Publishing Venue

Xerox Disclosure Journal

Abstract

Proposed is a device for depositing charge on a charge retentive surface. Referring to the accompanying Figure, the resistive charging device 80 includes an insulating support substrate 82 coated with a layer of highly resistive material 86, and a high voltage bus 84 coupled thereto for providing a high voltage potential across the layer of resistive material 86. As illustrated by an air gap 87, the resistive charging device 80 is positioned in close proximity to a charge retentive member which comprises a dielectric substrate 90 and a ground plane 91. The resistive charging device 80 provides a uniform charging potential for depositing ions onto the charge retentive surface of the dielectric substrate 90. A high voltage power supply 88 provides a voltage potential to the resistive layer 86 via the voltage bus 84. Preferably, the high voltage power supply 88 provides a DC voltage operating in the range of approximately 5 kilovolts. The air gap 87, separating the resistive charging device 80 from the dielectric substrate 90 may range from 0-10 millimeters.