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AEROSOL CLEANING OF PHOTORECEPTOR SUBSTRATE

IP.com Disclosure Number: IPCOM000027349D
Original Publication Date: 1996-Jun-30
Included in the Prior Art Database: 2004-Apr-07

Publishing Venue

Xerox Disclosure Journal

Abstract

Photoreceptor substrate cleaning is a critical step in the mandacturing process. Proposed is the use of high speed fine aerosol jet to clean the substrate. The aerosol can then be generated by mixing in a chamber a hot stream of inert gas saturated with chemical vapor and a cold stream of the inert gas. The aerosol can then be pushed through a slit nozzle to form a high speed stream and impinge onto the substrate for cleaning.