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ENHANCED ROTARY ATOMIZATION COATING CHAMBER

IP.com Disclosure Number: IPCOM000027424D
Original Publication Date: 1996-Dec-31
Included in the Prior Art Database: 2004-Apr-07

Publishing Venue

Xerox Disclosure Journal

Abstract

The present coating chamber configuration utilizes an open end into which a planetary transport having substrates mounted thereto is placed. As the transport seats into position, it provides a sealing surface that forms an air tight chamber. Each time the transport is withdrawn, the chamber is opened and the atmosphere escapes. The atmosphere may be contained by adding an enclosing disc to the chamber's open end. With further modification, the proposed disc may be converted to an exhaust plenum. The exhaust plenum provides a straight line, laminar flow which improves lengthy humidification cycle time and poor uniform purging originally caused by an input and output at the same chamber location.