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IP.com Disclosure Number: IPCOM000027542D
Original Publication Date: 1997-Aug-31
Included in the Prior Art Database: 2004-Apr-08

Publishing Venue

Xerox Disclosure Journal


Disclosed is a method for electrolytic cleansing of electrolytes and other charged impurities, for example, bacterial contamination, in electroplating baths. The method is accomplished, for example, by applymg an electric field, preferably direct current, in an electrolyte plating solution bath to plate out or to electrodeposit the impurities to clean the bath and to avoid or minimize the use of biocides. Thus, in an illustrative example, when a working electrode is placed in a plating bath containing inorganic and organic impurities, for example, salts and bacteria, application of k 10 volts, and preferably f 5 volts, at from about 10 to about 50 degrees Centigrade, for about 5 seconds to about 10 minutes, results in substantial diminution of charged impurities, including bacterial contamination as measured by deposits and microscopic examination of the deposits. In other embodiments, various waveform potentials can be applied to the working electrode if desired.